EUV Labs is an independent research and technical development company, active in multidisciplinary applications of plasma physics, atomic spectroscopy, plasma sources of radiation and discharge physics. The company has originated from the Institute for Spectroscopy RAS. The combination experimental skills in various fields of physics with advanced numerical simulation models is our key advantage.
We focus on bringing advanced plasma assisted technologies to the industry. Plasma sources for EUV lithography, optical nanodiagnostics and plasma-chemistry are among our interests. We are active both in contractual research and in development of IP protected solutions in various industries.
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